Title

Cio Radical Yields in the Reaction of O( 1D) With Cl 2, Hcl, Chloromethanes, and Chlorofluoromethanes

Document Type

Article

Publication Date

2010

Abstract

Absolute CIO radical product yields in the gas-phase reactions of O( 1D) with Cl2, HCl, CCl 4, CHCl 3, CH 2Cl 2, CH 3Cl, CFCl 3, CF 2Cl 2, CF 3Cl, CHFCl 2, and CHF 2Cl are reported. Product yields were measured using pulsedlaser photolysis of O 3 to produce O( 1D) in the presence of excess reactant combined with dual wavelength differential cavity ring-down spectroscopic detection of the ClO radical. ClO radical absorption cross sections for the A 2II ( v = 10) ←- X 2II(V = O) transition band head near 280 nm were determined between 200 and 296 K as part of this work. The ClO product yields obtained at room temperature were Cl 2 (0.77 ± 0.10), HCl (0.20 ± 0.04), CCl 4 (0.79 ± 0.04), CHCl 3 (0.77 ± 0.04), CH 2Cl 2 (0.73 ± 0.04), CH 3Cl (0.46 ± 0.06), CFCl 3(0.79 ± 0.04), CF 2Cl 2 (0.76 ± 0.06), CF 3Cl (0.82 ± 0.06), CHFCl 2 (0.73 ± 0.05), and CHF 2Cl (0.56 ± 0.03), where the quoted error limits are 2σ of the measurement precision. ClO product yields in the O( 1D) + Cl 2 and CFCl 3 reactions were found to be independent of temperature between 200 and 296 K, within the precision of the measurements. The absolute ClO yields obtained in this study are compared with previously reported values determined using relative and indirect methods © 2010 American Chemical Society.

This document is currently not available here.

Published Version

Share

COinS